Alternative Path for the Reduction of Semiconductor Global Warming Emission Gases by Surface Wave Plasma: Water as a Source of Radicals

Table of Contents

Alternative Path for the Reduction of Semiconductor Global Warming Emission Gases by Surface Wave Plasma: Water as a Source of Radicals

Abstract

Introduction

Surface Wave Plasmas

Microwave Plasma Abatement SystemIncluding On-Line Analytical Instrumentation.

Laboratory Installation of Surface Wave Plasma Abatement System

Product Distribution by FTIR

Product Distribution by QMS

DRE of CF4 vs. Applied Microwave Power

Conclusions

References